Nique (Figure 1b) [44]. This layer has been grown by exposing the sample, in a total of 90 AM3102 Formula cycles, to three diverse precursors: (3-aminopropyl) triethoxysilane (H2 N(CH2 )3 Si(OCH2 CH3 )three ) kept at a temperature of 100 C; water (H2 O) at 60 C and ozone (O3 ), even though the reaction temperature inside the chamber was fixed to 180 C. In line with the estimated deposition price of 0.06 nm/cycle, the nominal thickness of the SiO2 layer corresponds to 4 nm. This passivating SiO2 thin layer prevents additional chemical etching to happen and, thus, avoids any further enlargement of the pore diameter. The samples have been then reanodized beneath HA circumstances (140 V, 0 C) for 15 min, which causes the development of a brand new segment in the alumina nanopores that is definitely not protected by the SiO2 layer. Then, the unoxidized Al substrate that remains at the bottom in the alumina membranes was selectively dissolved in CuCl2 and HCl answer (Figure 1c). Chemically etching the samples in phosphoric acid (5 wt. , 30 C) causes the unprotected alumina pore segment to boost its pore diameter by up to around 250 nm, whereas theNanomaterials 2021, 11,4 ofone protected by the SiO2 ALD layer remains unaltered. Immediately after this procedure, a well-defined and sharp diameter modulation at the 3MB-PP1 CDK interface among the SiO2 coated and uncoated pore segments was produced (Figure 1d). Lastly, the samples were once again coated with an SiO2 thin layer of around three.five nm (70 cycles) in thickness, which avoided corrosion in the metallic nanowires if they were to become released from the HA alumina template [8,43]. To be able to carry out electrochemical deposition of FeCo alloy, a gold speak to was defined within the backside in the samples (Figure 1e) by sputtering and further electrodeposition from a commercial plating bath (Orosene 999, Technic, Lodi, Italy). The electrolyte for FeCo alloy electrodeposition consisted of 0.06 M CoSO4 , 0.13 M FeSO4 , and 0.16 M H3 BO3 . Continuous N2 bubbling was maintained for the duration of electrolyte preparation and additional electrodeposition processes, with the objective of avoiding oxidation of Fe2+ ions. The pulsed electrodeposition sequence consisted of 3000 pulses of 0.5 s at a continuous voltage of -1.8 V measured versus an Ag/AgCl reference electrode, separated by resting pulses of 0.5 s at open circuit possible (Figure 1f). 2.2. Characterization Methods Morphological and compositional characterization of nanowire samples was carried out inside a Scanning Electron Microscope (SEM, JEOL 5600, Akishima, Tokyo, Japan) equipped with an power dispersive X-ray (EDX) microanalysis technique (INCA, Oxford Instruments, Abingdon, UK) when maintaining the bisegmented diameter modulated nanowires still embedded in to the pores of the alumina matrix. As a way to supply extra precise measurements of your geometry of the nanowires, free-standing single nanowires had been also studied under a Transmission Electron Microscope (TEM, JEOL-2000-EXII, Akishima, Tokyo, Japan). This technique has also been employed to obtain Chosen Location Electron Diffraction (SAED) patterns from the magnetic FeCo nanowires to evaluate their crystalline structure. In this work, all magnetic characterizations have already been performed at space temperature. So as to possess a worldwide picture from the magnetization reversal for the whole system, the alloyed FeCo nanowire arrays measurements had been performed in a vibrating sample magnetometer (VSM, Versalab, Quantum Style Inc., San Diego, CA, USA) below applied magnetic fields as much as T. The magnetic study.